ALD is based on the sequential use of a gas phase chemical process. The ALD cycle consists of four main steps: (1) pulsing of a precursor A, (2) purging of the reactor to remove excess precursor and ...

Atomic layer deposition (ALD) used to be considered too slow to be of practical use in semiconductor manufacturing, but it has emerged as a critical tool for both transistor and interconnect ...

New GaN power electronics are being developed for power conversion and delivery. In electric transportation such as Electric and Hybrid Electric Vehicles (EV and HEV), these devices are becoming ...

For the first time in history, a pathway for ALD-enhanced materials to be rapidly developed and transitioned from lab-scale to commercial production is available for nearly any application. Until ...

Kalpana Systems, a Dutch equipment manufacturer, is launching spatial atomic layer deposition (sALD) tools to be used in roll-to-roll manufacturing processes in the solar PV, organic light emitting ...

Atomic layer deposition (ALD) is a bottom-up nanofabrication deposition method that technically falls within the remit of chemical vapor deposition (CVD) methods; but it has become well-regarded as a ...

Atomic layer deposition (ALD) originated from atomic layer epitaxy, which was introduced in 1970 and initially used in electroluminescent displays. It rapidly revolutionized semiconducting ...